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| sputtering targets(metal target, alloy target,ceramic target) |
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| Model No.︰ | - |
| Brand Name︰ | CRM |
| Country of Origin︰ | China |
| Unit Price︰ | - |
| Minimum Order︰ | 1 pc |
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coating materials for the applications to magnetic disk and head, magneto optical disk, optical disk, superconducting thin film, protective film.
Purity: 99%, 99.9%,99.95% 99.99%,99.995% 99.999% and 99.9999%.
Shape: foil, sheet, wire, filament, rod, pipe, tube, powder, pellet, shot, wafer, plate, tablet, ingot, chunk, lump, granule, dendritic, crystal, etc.
Dimension: Diameter (<500mm), Length (<1000mm), Width (<500mm), Thickness (>1mm), Custom-Made
High Pure Metal Sputtering Targets or rare earth metal sputtering targets: Lanthanum (La),Cerium (Ce),Praseodymium (Pr), Neodymium (Nd),Samarium (Sm),Eur (Eu),Gadolinium (Gd),Terbium (Tb),Dysprosium (Dy),Holmium (Ho), Erbium (Er) ;Aluminum (Al),Antimony (Sb),Bismuth (Bi),Boron (B),Cadmium (Cd),Carbon (C),Chromium (Cr),Cobalt (Co),Copper (Cu),Germanium (Ge),Gold (Au) ,Graphite (C),Hafnium (Hf) , Indium (In),Iridium (Ir),Iron (Fe),Magnesium (Mg),Manganese (Mn),Molybdenum (Mo),Nickel (Ni),Niobium (Nb) ,Palladium (Pd),Platinum (Pt),Rhenium (Re) ,Ruthenium (Ru),Selenium (Se),Silver (Ag),Silicon (Si),Tantalum (Ta),Tin (Sn),Titanium (Ti),Tungsten (W),Vanadium (V),Zirconium (Zr),Zinc (Zn)
Alloy Sputtering Targets: Aluminum Copper (Al-Cu),Aluminum Silicon (Al-Si),Cerium Gadolinium (Ce-Gd), Aluminum Magnesium(Al-Mg),Aluminum Silver (Al-Ag),Chromium Aluminum (Cr-Al),Cerium Samarium (Ce-Sm),Chromium Silicon (Cr-Si),Cobalt Chromium (Co-Cr),Cobalt Iron (Co-Fe),Cobalt Iron Boron (Co-Fe-B),Copper Gallium (Cu-Ga), Copper Nickel (Cu-Ni),Copper Zirconium (Cu-Zr),In dium Tin (In-Sn),Iridium Manganese (Ir-Mn),Iron Boron (Fe-B), Iridium Rhenium (Ir-Re),Iron Carbon (Fe-C),Molybdenum Silicon (Mo-Si),Nickel-Aluminum (Ni-Al),Nickel-Chromium (Ni-Cr), Nickel-Chromium Silicon (Ni-Cr-Si),Nickel-Iron (Ni-Fe),Nickel-Titanium (Ni-Ti),Nickel-Vanadium (Ni-V),Silver Copper (Ag-Cu),Silver Tin (Ag-Sn), Samarium Cobalt (Sm-Co),Tantalum Aluminum (Ta-Al),Titanium Aluminum (Ti-Al),Titanium Nickel (Ti-Ni),Terbium Dysprosium Iron Alloy (TbDyFe),Terbium Iron Alloy (TbFe),Zirconium Aluminum (Zr-Al),Zirconium Iron (Zr-Fe),Zirconium Nickel (Zr-Ni),Zirconium Niobium (Zr-Nb) ,Zirconium Titanium (Zr-Ti), Zirconium Yttrium (Zr-Y)
Ceramic Sputtering Targets:(Boride Sputtering Targets ,Carbide Sputtering Targets,Fluoride Sputtering Targets,
Nitrides Sputtering Targets ,oxide sputtering targets,Selenides Sputtering Targets,Sulfides Sputtering Targets )
Boride Sputtering Targets
Chromium Boride (Cr2B),Chromium Boride (CrB),Chromium Boride (CrB2),Chromium Boride (Cr5B3), Iron Boride (FeB),Hafnium Boride (HfB2),Lanthanum Boride (LaB6),Molybdenum Boride (Mo2B),Molybdenum Boride (Mo2B5),Niobium Boride (NbB),Niobium Boride (NbB2),Tantalum Boride (TaB),Tantalum Boride (TaB2),Titanium Boride (TiB2),Tungsten Boride (W2B),Tungsten Boride (WB),Vanadium Boride (VB),Vanadium Boride (VB2),Zirconium Boride (ZrB2)
Carbide Sputtering Targets
Boron Carbide (B4C),Chromium Carbide (Cr3C2),Hafnium Carbide (HfC),Molybdenum Carbide (Mo2C),Niobium Carbide (NbC),Silicon Carbide (SiC),Tantalum Carbide (TaC),Titanium Carbide (TiC),Tungsten Carbide (WC),Tungsten Carbide (W2C),Vanadium Carbide (VC),Zirconium Carbide (ZrC)
Fluoride Sputtering Targets
Aluminium Fluoride (AlF3),Barium Fluoride (BaF3),Cadmium Fluoride (CdF2), Calcium Fluoride (CaF2), Cerium Fluoride (CeF3), Dysprosium Fluoride (DyF3),Erbium Fluoride (ErF3) ,Hafnium Fluoride (HfF4),Kalium Fluoride (KF),Lanthanum Fluoride (LaF3)
Lead Fluoride (PbF2),Lithium Fluoride (LiF), Praseodymium Fluoride (PrF3), Magnesium Fluoride (MgF2), Neodymium Fluoride (NdF3), Rare Earth Fluoride (ReF3) ,Samarium Fluoride (SmF3),
Sodium Fluoride (NaF) ,Sodium Aluminum Fluoride (Cryolite) Na3AlF6 ,Strontium Fluoride (SrF2),Thorium Fluoride (ThF4),Yttrium Fluoride (YF3),Ytterbium Fluoride (YbF3)
Nitrides Sputtering Targets
Aluminum Nitride (AlN), Boron Nitride (BN),Gallium Nitirde(GaN), Hafnium Nitride (HfN), Niobium Nitride (NbN), Silicon Nitride (Si3N4), Tantalum Nitride (TaN), Titanium Nitride (TiN), Vanadium Nitride (VN), Zirconium Nitride (ZrN)
Oxide Sputtering Targets
Aluminum Oxide (Al2O3), Antimony Oxide (Sb2O3),Antimony Tin Oxide (ATO),Barium Titanate (BaTiO3),Bismuth Oxide (Bi2O3),Cerium Oxide (CeO2),Copper Oxide (CuO),Chromium Oxide (Cr2O3) ,Dysprosium Oxide (Dy2O3),Erbium Oxide (Er2O3),Eur Oxide (Eu2O3),Gadolinium Oxide (Gd2O3),Gallium Oxide (Ga2O3),Germanium Oxide (GeO2),Hafnium Oxide (HfO2) ,Holmium Oxide (Ho2O3),Indium Oxide (In2O3),Indium Tin Oxide (ITO) ,Iron Oxide (Fe2O3) ,Iron Oxide (Fe3O4),Lanthanum Oxide (La2O3),Lead Titanate (PbTiO3),Lead Zirconate (Pb ZrO3),Lithium Niobate (LiNbO3), Lutetium Iron Oxide (Lu3Fe5O12),Lutetium Oxide (Lu2O3),Magnesium Oxide (MgO),Molybdenum Oxide (MoO3),Neodymium Oxide (Nd2O3),Praseodymium Oxide (Pr6O11),Praseodymium Titanate (Pr(TiO2)2),Praseodymium Oxide (Pr2O3),Samarium Oxide (Sm2O3),Scandium Oxide (Sc2O3),Silicon Dioxide (SiO2),Silicon Monoxide (SiO),Strontium Titanate (SrTiO3),Strontium Zirconate (SrZrO3),Tantalum Pentoxide (Ta2O5),Terbium Oxide (Tb4O7),Tellurium Oxide (TeO2),Thorium Oxide (ThO2),Thulium Oxide (Tm2O3),Titanium Dioxide (TiO2),Titanium Monoxide (TiO),Titanium Pentoxide (Ti3O5),Titanium Trioxide (Ti2O3),Tin Dioxide (SnO2),Tin Monoxide (SnO),Tungsten oxide (WO3),Vanadium Pentoxide (V2O5),Yttrium Aluminum Oxide (YAG)Y3Al5O12,Ytterbium Oxide (Yb2O3),Yttrium Oxide (Y2O3),Zinc Oxide (ZnO),Zinc Aluminum Oxide (ZnO:Al),Zirconium Oxide (ZrO2) (unstabilized),Zirconium Oxide (ZrO2-5-15wt%CaO)
Selenides Sputtering Targets
Bismuth Selenide (Bi2Se3),Cadmium Selenide (CdSe),Indium Selenide (In2Se3),Lead Selenide (PbSe),Molybdenum Selenide (MoSe2),Niobium Selenide (NbSe2),Tantalum Selenide (TaSe2),Tungsten Selenide (WSe2),Zinc Selenide (ZnSe)
Silicides Sputtering Targets
Chromium Silicide (Cr3Si),Chromium Silicide (CrSi2),Cobalt Silicide(CoSi2), Hafnium Silicide (HfSi2),Molybdenum Silicide (MoSi2),Niobium Silicide (NbSi2),Tantalum Silicide (TaSi2),Tantalum Silicide (Ta5Si3),Titanium Silicide (TiSi2),Titanium Silicide (Ti5Si3),Tungsten Silicide (WSi2),Vanadium Silicide (V3Si),Vanadium Silicide (VSi2),Zirconium Silicide (ZrSi2)
Sulfides Sputtering Targets
Antimony Sulfide (Sb2S3) ,Arsenic Sulfide (As2S3),Cadmium Sulphide ( CdS),Iron Sulfide (FeS),Lead Sulfide (PbS),Molybdenum Sulfide (MoS2),Niobium Sulfide (NbS1.75),Tantalum Sulfide (TaS2),Tungsten Sulfide(WS2),Zinc Sulphide (ZnS),
Tellurides Sputtering Targets
Cadmium Telluride (CdTe),Lead Telluride (PbTe),Molydenum Telluride (MoTe2),Niobium Telluride (NbTe2),Tantalum Telluride (TaTe2),Tungsten Telluride (WTe2),Zinc Telluride (ZnTe)
Other
Cr-SiO,
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| Specifications︰ | Purity: 99%, 99.9%, 99.99%, 99.999% and 99.9999%.
Shape: foil, sheet, wire, filament, rod, pipe, tube, powder, pellet, shot, wafer, plate, tablet, ingot, chunk, lump, granule, dendritic, crystal, etc.
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| Advantages︰ | Quality is of paramount importance as we match the material to the client's needs and ensure its complete traceability. CRM has strict quality control system in the whole process, including raw material selection, production and finished product testing.
CRM pride ourselves on prompt responses and competitive pricing.
Also we design, synthesize, and manufacture new materials and compounds based on customer requirements.
If you have some products looking for, Please contact us at anytime, We will come to you and provide you our best quotation and best service or at least point you in the right direction.
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| Min Order︰ | 1piece |
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